I use plenty of 3A and 4A molecular sieves, mostly to dry alcohols.
Unfortunately, the reactivation is an ordeal as I can use only a 2L heating mantle for that - I usually VERY slowly heat it up to prevent melting of
the glass and even then it takes few hours until last droplets of water escape. Then I pump out the air which releases more water. The whole procedure
is very time consuming. I though about running dry nitrogen or argon slowly through the flask to drive the vapour off to speed things up a bit.
I wonder if one can use kiln instead as this provides high enough temperatures for drying sieves at atmospheric pressure (300 °C and more) and many
kilns can be programmed for convenience.
Vacuum ovens reach lower temperatures (only about 250 °C), but enough for drying sieves under vacuum (I assume temperatures over 200 °C and pressure
of 100 mbar is sufficient). Vacuum ovens are maybe more useful as I can use them to dry sensitive solids, glassware etc.
I am also thinking about some makeshit solution like putting sealed evacuated flask with sieves in ordinary oven set at max temperature (220-250 °C),
leave it there and periodically flush it with dry gas to remove the released water vapour.
What would be your choice for drying molecular sieves?
I don't need them absolutely dry since I don't do any moisture-sensitive work, usually just need to break ethanol-water azeotrope or pre-dry solvents
for precipitation of hygroscopic salts. |