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Nikky
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[*] posted on 24-3-2009 at 18:17
Al2O3


What chemical need to use to remove Al2O3 after deposition?



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kclo4
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[*] posted on 24-3-2009 at 18:48


Sodium hydroxide should work.

Al2O3 + 3 H2O + 2 NaOH → 2NaAl(OH)4




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chemoleo
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24-3-2009 at 19:15
woelen
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[*] posted on 25-3-2009 at 04:29


It depends on how the Al2O3 is deposited. If this is from a high-temperature reaction, then certainly the dissolved NaOH-method does not work. Al2O3 becomes extremely inert when it is calcined and one needs molten NaOH to get it dissolved.

if the Al2O3 is formed from aqueous solution and is not calcined, then things are different. Such non-calcined Al2O3 (better: Al2O3.nH2O) easily dissolves in an aqueous solution of NaOH.




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PHILOU Zrealone
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[*] posted on 25-3-2009 at 07:43


Also depends on what it is deposited!
Maybe what is proposed to remove the Al2O3 is not suitable for the support...




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chief
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[*] posted on 25-3-2009 at 16:06


Al2O3 has a optimum of solubility around PH 9 ; but still only very slightly soluble. A very fine powder might dissolve over long timeframes ...

There is a reason for Al2O3 beeing a gemstone in the appearance of ruby and saphir: Over ages and ages it didn't dissolve and still can be found in the nature ... : That's inertness !

[Edited on 26-3-2009 by chief]
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kclo4
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[*] posted on 25-3-2009 at 18:02


Nikky, can you give us more information on this problem of yours?



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daragh8008
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[*] posted on 19-2-2013 at 03:45


Quote: Originally posted by woelen  
It depends on how the Al2O3 is deposited. If this is from a high-temperature reaction, then certainly the dissolved NaOH-method does not work. Al2O3 becomes extremely inert when it is calcined and one needs molten NaOH to get it dissolved.



any idea of what kind of etch rates you would get with that?? I have a 250 um wafer that need thinning.
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