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WGTR
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Posts: 972
Registered: 29-9-2013
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Long term, if you want to play around with etching a variety of substrates, I would suggest building or buying an old plasma etcher. SF6 is one
fluorine-containing feed gas that is used for etching silicon. The advantage of plasma etching in this case is that SF6 is pretty inert, and the
reactive species are minimal and generated in-situ under low pressure. Plasma etching is also a very clean process.
https://afm.oxinst.com/learning/view/article/fast-smooth-etc...
I have an old plasma etcher (probably 1980’s-90’s vintage) in the lab along with several bottled gasses such as SF6, oxygen, CHCl3, N2, and 1-2
others. You can use one material as an etching mask for a silicon etch, then switch gasses and remove the mask afterwards, without attacking the
silicon. Very cool stuff.
As for concentrated HF, I have used it 1-2 times, under extreme duress and with excessive amounts of PPE. I avoid it much like I avoid chromic acid.
[Edited on 25-02-05 by WGTR]
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MrDoctor
Hazard to Self
Posts: 60
Registered: 5-7-2022
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thankfully that is the case, unless im mistaken, HF in solution should react with silver carbonate at any concentration. so i just have to find a nice
safe way to transfer that HF into water. I think i should probably do up a thread of my own for this tho rather than intrude into someone elses, since
i technically dont need HF, its just in my limited understanding HF is the only clear choice i can see.
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