umesh2329 - 3-1-2012 at 05:19
Dear Friends,
I wish to carry out chlorination of porous silica in order to later functionalize it with amine group (-NH2). My aim is to get maximum amine groups on
silca without compromising on its surface area and w/o blockign pore ( thats what happens while doing post synthesis grafting using widly used method
of aminopropane tri ethoxy silane i.e. APTES grafting in tolune). There is very few literature regarding this with several views...I will be following
following route
1) SOCl2 (50ml) + Silica (5g) -> reflux for 48hrs at 80 C.
2) dry under vaccum at 90C to remove access SOCl2 and some byproduct (i.e. SO2 and HCl).
3) Treatment with ammonia gas at room temperature..
it would be of greta help to me if you could suggest any improvment/modification in my method so as to get my ultimate aim i.e. stable (upto 100C)
Si-NH2 groups with very high amine content....
Thanks a lot....
Adas - 3-1-2012 at 06:47
Wow, this is very interesting, but waht would be this compound's use? I don't get it :/