| Bio: |
I specialize in repairing and maintaining ion implantation equipment, a crucial component in semiconductor manufacturing. This process involves precisely implanting ions into silicon wafers to modify their electrical properties, a key step in creating integrated circuits. Ensuring these machines operate efficiently and accurately is vital for maintaining high yields and consistent chip performance in the fabrication process. Some of the gasses we use for doping are Boron Trifluoride, Arsine, Phosphine, and Germanium; we use Antimony and one other something Iodide, but I just can't remember! |
